9 July 1992 keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper)
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Abstract
A keV x-ray source based on plasma production using a high repetition rate picosecond KrF laser has been developed. By using a train of 50 ps input pulses to extract a KrF amplifier module an output train of pulses of energy up to 200 mJ has been obtained leading to generation of 1.15 keV x-rays from solid copper targets with a conversion efficiency from laser light to x-rays of over 1.5%. Iron and nickel targets yield softer x-ray spectra with higher conversion efficiencies of 2.3% and 1.8% respectively. When operated at 20 Hz in one atmosphere of background helium gas a point source of 1.15 keV x-rays with an average power of 45 mW is obtained. Initial characterization of the sensitivities of a positive resist, PBS, and a negative resist, Shipley XP90104C, have been carried out to demonstrate the effectiveness of the source.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Fedosejevs, Romuald Bobkowski, James N. Broughton, B. Harwood, "keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); doi: 10.1117/12.136027; https://doi.org/10.1117/12.136027
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