1 June 1992 Diazonaphthoquinone-sensitized deep-UV resist materials
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Abstract
This paper describes novel diazonaphthoquinone-sensitized deep UV resist materials and a process for improving the pattern profile thereof; namely, incorporation of an alkaline treatment subsequent to the exposure in the processing.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seiki Fukunaga, Tomoyuki Kitaori, Hiroo Koyanagi, Shin'ichi Umeda, Kohtaro Nagasawa, "Diazonaphthoquinone-sensitized deep-UV resist materials", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59775; https://doi.org/10.1117/12.59775
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