1 June 1992 Diazonaphthoquinone-sensitized deep-UV resist materials
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Abstract
This paper describes novel diazonaphthoquinone-sensitized deep UV resist materials and a process for improving the pattern profile thereof; namely, incorporation of an alkaline treatment subsequent to the exposure in the processing.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seiki Fukunaga, Seiki Fukunaga, Tomoyuki Kitaori, Tomoyuki Kitaori, Hiroo Koyanagi, Hiroo Koyanagi, Shin'ichi Umeda, Shin'ichi Umeda, Kohtaro Nagasawa, Kohtaro Nagasawa, } "Diazonaphthoquinone-sensitized deep-UV resist materials", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59775; https://doi.org/10.1117/12.59775
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