1 June 1992 Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography
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Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992); doi: 10.1117/12.59744
Event: Microlithography '92, 1992, San Jose, CA, United States
Abstract
Starting from general arguments on hexafluoroacetone chemistry, an exploratory investigation of the utility of this new type of resist chemistry is presented. The 2- hydroxyhexafluoroisopropyl-group (HHFIP) proves to be comparable to phenolic groups in respect to acidity and reactivity. Polymers containing HHFIP-moieties are high transparent alkali-soluble binder materials for functional group deprotection type, dissolution inhibition type, and crosslinking type photo resist materials. Dissolution inhibitors containing the HHFIP-function show superior inhibition properties due to strong hydrogen bond interaction with the matrix polymer.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Klaus Juergen Przybilla, Horst Roeschert, Georg Pawlowski, "Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59744; https://doi.org/10.1117/12.59744
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KEYWORDS
Polymers

Photoresist materials

Lithography

Resist chemistry

Chemistry

Deep ultraviolet

Hydrogen

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