1 June 1992 Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography
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Abstract
Starting from general arguments on hexafluoroacetone chemistry, an exploratory investigation of the utility of this new type of resist chemistry is presented. The 2- hydroxyhexafluoroisopropyl-group (HHFIP) proves to be comparable to phenolic groups in respect to acidity and reactivity. Polymers containing HHFIP-moieties are high transparent alkali-soluble binder materials for functional group deprotection type, dissolution inhibition type, and crosslinking type photo resist materials. Dissolution inhibitors containing the HHFIP-function show superior inhibition properties due to strong hydrogen bond interaction with the matrix polymer.
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Klaus Juergen Przybilla, Horst Roeschert, Georg Pawlowski, "Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59744; https://doi.org/10.1117/12.59744
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