1 June 1992 tert-Butoxycarbonylated novolac resins as chemically amplified imaging materials
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Abstract
A sensitive, dual-tone, chemically amplified deep-UV and electron-beam resist system has been studied. The resist is composed of tert-butoxycarbonylated novolac (tBOC-N) and a photoacid generator (PAG). Preferably, the matrix polymer is synthesized from novolacs, from which the low molecular weight fraction has been removed by fractionation or extraction. The polymer is highly transparent at (lambda) > 240 nm (OD approximately equals 0.15/micrometers ) and is thermally stable up to ca. 170 - 180 degree(s)C. While the deblocked polymer remains insoluble in aqueous bases, it can be developed in lower alcohols. The dual- tone resist exhibits sensitivity of < 5 mJ/cm2 at 254 nm and < 3 (mu) C/cm2 at 50 kV. Very high resolution, negative-tone structures were defined in this resist by electron- beam lithography.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Antoni S. Gozdz, John A. Shelburne, "tert-Butoxycarbonylated novolac resins as chemically amplified imaging materials", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59729; https://doi.org/10.1117/12.59729
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