Measurement of multilayer film and reflectivity on wafers using ultraviolet-visible microspectrophotometry

Warren Lin; Vincent J. Coates; Bhanwar Singh

doi:10.1117/12.59833

1 June 1992 Measurement of multilayer film and reflectivity on wafers using ultraviolet-visible microspectrophotometry

Warren Lin, Vincent J. Coates, Bhanwar Singh

Proceedings Volume 1673, Integrated Circuit Metrology, Inspection, and Process Control VI; (1992) https://doi.org/10.1117/12.59833
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

An ultraviolet (UV) microspectrophotometer, the NanoSpecTM/AFT 210UV, with a measuring spot size less than 10 microns, can make accurate measurements of SiO2 on polysilicon, and thin SiO2 on aluminum. Various materials are presented for comparison in both the UV and visible range.

Citation Download Citation

Warren Lin, Vincent J. Coates, and Bhanwar Singh "Measurement of multilayer film and reflectivity on wafers using ultraviolet-visible microspectrophotometry", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); https://doi.org/10.1117/12.59833

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