1 June 1992 Measurement of multilayer film and reflectivity on wafers using ultraviolet-visible microspectrophotometry
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Abstract
An ultraviolet (UV) microspectrophotometer, the NanoSpecTM/AFT 210UV, with a measuring spot size less than 10 microns, can make accurate measurements of SiO2 on polysilicon, and thin SiO2 on aluminum. Various materials are presented for comparison in both the UV and visible range.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Warren Lin, Warren Lin, Vincent J. Coates, Vincent J. Coates, Bhanwar Singh, Bhanwar Singh, } "Measurement of multilayer film and reflectivity on wafers using ultraviolet-visible microspectrophotometry", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); doi: 10.1117/12.59833; https://doi.org/10.1117/12.59833
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