Overlay process control for 16-Mb DRAM manufacturing

Audrey C. Engelsberg; Debra Leach

doi:10.1117/12.59826

1 June 1992 Overlay process control for 16-Mb DRAM manufacturing

Audrey C. Engelsberg, Debra Leach

Proceedings Volume 1673, Integrated Circuit Metrology, Inspection, and Process Control VI; (1992) https://doi.org/10.1117/12.59826
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

The tighter film and image size tolerances required for technologies at 0.5 micrometers and below make the control of overlay a critical process parameter. A modeling approach has been developed that is independent of the metrology tool and flexible enough to control overlay for a mix-and-match photolithography strategy. This paper describes the application of the methodologies developed and implemented to control overlay.

Citation Download Citation

Audrey C. Engelsberg and Debra Leach "Overlay process control for 16-Mb DRAM manufacturing", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); https://doi.org/10.1117/12.59826

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