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1 June 1992 Overlay process control for 16-Mb DRAM manufacturing
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Abstract
The tighter film and image size tolerances required for technologies at 0.5 micrometers and below make the control of overlay a critical process parameter. A modeling approach has been developed that is independent of the metrology tool and flexible enough to control overlay for a mix-and-match photolithography strategy. This paper describes the application of the methodologies developed and implemented to control overlay.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Audrey C. Engelsberg and Debra Leach "Overlay process control for 16-Mb DRAM manufacturing", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); https://doi.org/10.1117/12.59826
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