1 June 1992 Submicrometer dimensional measurements with optical microscopy
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We describe here a new approach for measuring focus/exposure dense photoresist line structures with a 1 micrometers spatial period. The algorithm depends on a data clustering technique which allows us to measure resist lines down to 0.3 micrometers . With an advanced calibration procedure, linearity between optical and SEM measurements is achieved down to 0.3 micrometers for nested focus/exposure resist structures with a standard deviation of about 10 nm.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stanley S. C. Chim, Stanley S. C. Chim, Gordon S. Kino, Gordon S. Kino, "Submicrometer dimensional measurements with optical microscopy", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); doi: 10.1117/12.59782; https://doi.org/10.1117/12.59782

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