1 June 1992 Advanced krypton fluoride excimer laser for microlithography
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Abstract
In this paper, we present performance, reliability, and maintainability data for the ELS-4000, a production-worthy, spectrally narrowed KrF excimer laser for wafer steppers. This laser uses the same modular design concept as its predecessor, the CX-2LS. The ELS-4000 exhibits the following specifications: (i) spectral bandwidth (FWHM) less than 2.0 pm; (ii) wavelength stability less than or equal to 0.25 pm; (iii) output power of 4 W at 400 Hz; (iv) pulse-to-pulse energy stability less than or equal to 2.5%; (v) fast and accurate wavelength slewing and locking capability; (vi) small footprint measuring 0.74 m by 1.36 m; (vii) mean productive time between failures exceeding 700 hours; and (viii) design and engineering features, which meet all the safety standards of the semiconductor industry.
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Toshihiko Ishihara, Toshihiko Ishihara, Richard L. Sandstrom, Richard L. Sandstrom, Christopher Reiser, Christopher Reiser, Uday K. Sengupta, Uday K. Sengupta, } "Advanced krypton fluoride excimer laser for microlithography", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130343; https://doi.org/10.1117/12.130343
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