1 June 1992 Computer-aided optimal design of phase-shifting masks
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Abstract
Phase-shifting masks are expected to improve the resolution of photolithography without renovation of exposure systems. However, the problem of finding an effective method for designing phase-shifting masks for arbitrary IC patterns has been open for several years. We propose here a computational strategy to solve this problem. The computational complexity of the proposed technique is 0(N3), where N is the total number of pixels on the image plane. Simulation results show that with optimally designed phase-shifting masks, 0.45?/NA contact hole, 0.45?/NA single space, and 0.30?/NA periodic lines/spaces may be printed.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chih-Yuan Chang, Charles D. Schaper, and Thomas Kailath "Computer-aided optimal design of phase-shifting masks", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130310; https://doi.org/10.1117/12.130310
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