Paper
1 June 1992 Fabrication and evaluation of chromium/phase-shifter/quartz structure phase-shift mask
Tadao Yasuzato, Haruo Iwasaki, Hiroshi Nozue, Kunihiko Kasama
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Abstract
The deviation of phase shift angle from 180° seriously deteriorates the focus latitude. In order to obtain the expected performance of phase shift mask, a Chromium(Cr)/Phase-Shifter/Quartz(Qz) structure is investigated. In this phase shift mask structure, the shifter thickness i.e., phase shift angle, can be precisely controlled, compared with a conventional Shifter/Cr/Qz structure. Spin-on-grass(SOG) is used as the phase shifter material because of its excellent thickness uniformity. Alternating phase shift mask that has the Cr/SOG/Qz structure was fabricated using Ar-laser writing method, and evaluated using a NA=0.45, 6=0.3-0.5,I-line stepper. Obtained results show that this phase shift mask structure is very promising for the subhalfmicron pattern formation.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tadao Yasuzato, Haruo Iwasaki, Hiroshi Nozue, and Kunihiko Kasama "Fabrication and evaluation of chromium/phase-shifter/quartz structure phase-shift mask", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130324
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Cited by 4 scholarly publications.
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KEYWORDS
Phase shifts

Photomasks

Chromium

Optical lithography

Chlorine

Semiconducting wafers

Photoresist processing

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