Holographic mask-aligner

Francis S. M. Clube; Simon Gray; Massoud Hamidi; Basil Arthur Omar; Denis Struchen; Jean-Claude Tisserand

doi:10.1117/12.130368

1 June 1992 Holographic mask-aligner

Francis S. M. Clube, Simon Gray, Massoud Hamidi, Basil Arthur Omar, Denis Struchen, Jean-Claude Tisserand

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130368
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

Total internal reflection holography permits high resolution, non-contact lithography over very large fields. A prototype lithographic system has been constructed employing scanning illumination, focus and alignment subsystems integrated onto a 4" wafer handling mechanism. Resolution down to 0.25u has been achieved with a present alignment capability of <1u. A fine alignment system under development has been demonstrated to be capable of <0.1u accuracy. The technology is well suited to many applications, including flat panel displays, DRAMs, surface acoustic wave devices and optical storage disks.

Citation Download Citation

Francis S. M. Clube, Simon Gray, Massoud Hamidi, Basil Arthur Omar, Denis Struchen, and Jean-Claude Tisserand "Holographic mask-aligner", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130368

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