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1 June 1992 Modeling of optical images in resists by vector potentials
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Abstract
A new model is presented to calculate the electromagnetic fields inside a resist according to vector potentials. The model can handle three-dimensional electromagnetic fields with fewer variables than Maxwell’s equation. The perturbation theory is applied to this model to describe the resist bleaching process.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroyoshi Tanabe "Modeling of optical images in resists by vector potentials", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130360
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