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1 June 1992 New process technology for CD control in deep-submicron optical lithography
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Abstract
An effective and practical control technology of critical dimensions for submicron VSLI is presented. An ARCOR (Anti-Reflective Coating On Resist) process was improved, which is applied as a transparent type anti-reflective coating. A water soluble and low refractive index film was developed for this purpose. The following five items were measured experimentally and discussed : (1) amplitude of swing curve's dependence on resist thickness, (2) thickness latitude of the ARCOR film, (3) photo speed, (4) CD variations in a submicron DRAM and (5) alignment accuracy with a bright field alignment system.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Aritoshi Sugimoto, Osamu Suga, Kazuyuki Suko, and Hitoshi Arakawa "New process technology for CD control in deep-submicron optical lithography", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130317
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