A novelmicrolithographysystem with high precision and high performance is suggested in this paper. In the system,
sub-micrometer focused laser beam was used to carve spot by spot on a disk, which was covered by photoresist and was
mounted on a uniform turning stage. Pre-designed pattern can be obtained by two dimensional scanning which was realized
by using a high precision turning stage and a high precision radial moving stage. The system has the advantages of high
speed ( > 10meter sec for single laser beam), high precision (angle precision better than 0.2"), simple structure and using
low price objective. We can not only make very large pattern (> 1011pixels), but also make a set of (eg. 5-6 pieces) masks
using in LSIC production on one disk. Detailed principles and performances of the microlithography system will be
introduced in this paper.