1 June 1992 Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)
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Abstract
The research of ways to increase the degree of integration and the functional possibilities of integrated circuits in recent years has resulted in the development of new investigations directed to the creation of new technological processes with high resolution. In the developing of submicron and nanometer technologies, physical and technical difficulties appear that are more critical in comparison with the problems of "old" classical microtechnology
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Dmitrii R. Ilkayev, Tariel M. Makhviladze, Kamil A. Valiev, "Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130373; https://doi.org/10.1117/12.130373
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