Resolution enhancement of stepper by complementary conjugate spatial filter

Minori N. Noguchi; Yasuhiro Yoshitake; Yukio Kembo

doi:10.1117/12.130370

1 June 1992 Resolution enhancement of stepper by complementary conjugate spatial filter

Minori N. Noguchi, Yasuhiro Yoshitake, Yukio Kembo

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130370
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

An ultra-high resolution stepper is proposed, which combines annular illumination and a complementary conjugate spatial filter. This technique reproduces deep submicron complex non-repeated patterns by relatively emphasizing the diffracted light from high spatial-frequency patterns. Images of several patterns are simulated for a conventional stepper, a stepper with phase shifting, and for the proposed technique. The results indicate that this technique has the potential to pattern 0.3-|im images using an i-line stepper with 0.5 N.A. with conventional masks. It should enable stepper ranges to be extended to the next generation of DRAMs.

Citation Download Citation

Minori N. Noguchi, Yasuhiro Yoshitake, and Yukio Kembo "Resolution enhancement of stepper by complementary conjugate spatial filter", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130370

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available