1 June 1992 Rigorous and practical vector model for phase-shifting masks in optical lithography
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Abstract
A new vector (true two-dimensional) optical lithography modeling program, METROPOLE, is presented which incorporates arbitrary mask geometries. This rigorous model is thus ideally suited for the simulation of phase shifting masks. The efficiency of the electric field calculations, both within the mask and on the substrate structures, allows its use on accessible engineering workstations. Several simulation examples are presented, and include the new phase shifting on the substrate technique (POST).
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin D. Lucas, Chi-Min Yuan, Andrzej J. Strojwas, "Rigorous and practical vector model for phase-shifting masks in optical lithography", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); doi: 10.1117/12.130369; https://doi.org/10.1117/12.130369
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