1 July 1992 Noises accompanying the inhomogeneous current flow in thin film structures
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Two independent low-frequency noise sources originating from inhomogeneous current flow in thin dielectric films were revealed in thin film structures. One of them is connected with the existence of local leakage channels while the other is due to the modulation of the injection current by processes of charge capture and release by traps inhomogeneously distributed in the contact region. Physical models were developed which accounted for the high level of noise power and its frequency dependence.
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Yacov O. Roizin, Yacov O. Roizin, "Noises accompanying the inhomogeneous current flow in thin film structures", Proc. SPIE 1679, Physics and Simulation of Optoelectronic Devices, (1 July 1992); doi: 10.1117/12.60481; https://doi.org/10.1117/12.60481

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