5 January 1993 Multilevel grating array illuminators in fused silica
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Proceedings Volume 1718, Workshop on Digital Holography; (1993) https://doi.org/10.1117/12.138559
Event: Workshop on Digital Holography, 1992, Prague, Czech Republic
Abstract
In this paper we discuss the design, fabrication, and performance of multi-level grating array illuminators. A complete fabrication error analysis is carried out for one dimensional designs with sixteen equally spaced relief levels. Array illuminators with eight/sixteen relief depth levels are fabricated in fused silica using reactive ion etching and photolithography with three/four electron bema binary amplitude masks. Fanouts as large as 32 X 16 and efficiencies > 90% have been achieved, which to our knowledge are the largest and most efficient realized to date using multi-level relief structures.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Michael Miller, J. Michael Miller, Mohammad R. Taghizadeh, Mohammad R. Taghizadeh, Jari Pekka Turunen, Jari Pekka Turunen, Neil Ross, Neil Ross, Antti H. Vasara, Antti H. Vasara, } "Multilevel grating array illuminators in fused silica", Proc. SPIE 1718, Workshop on Digital Holography, (5 January 1993); doi: 10.1117/12.138559; https://doi.org/10.1117/12.138559
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