5 January 1993 Proximity-compensated kinoforms directly written by e-beam lithography
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Proceedings Volume 1718, Workshop on Digital Holography; (1993) https://doi.org/10.1117/12.138556
Event: Workshop on Digital Holography, 1992, Prague, Czech Republic
Abstract
We report on direct-writing EBL manufactured, proximity compensated blazed transmission gratings. The proximity compensation is made using a non-linear iterative process in the spatial domain. The diffraction efficiency for a compensated 8 micron period grating was 84%, almost twice that of an uncompensated grating.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mats Ekberg, Mats Ekberg, J. Michael Larsson, J. Michael Larsson, Fredrik K. Nikolajeff, Fredrik K. Nikolajeff, Sverker Hard, Sverker Hard, } "Proximity-compensated kinoforms directly written by e-beam lithography", Proc. SPIE 1718, Workshop on Digital Holography, (5 January 1993); doi: 10.1117/12.138556; https://doi.org/10.1117/12.138556
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