5 January 1993 Proximity-compensated kinoforms directly written by e-beam lithography
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Proceedings Volume 1718, Workshop on Digital Holography; (1993) https://doi.org/10.1117/12.138556
Event: Workshop on Digital Holography, 1992, Prague, Czech Republic
We report on direct-writing EBL manufactured, proximity compensated blazed transmission gratings. The proximity compensation is made using a non-linear iterative process in the spatial domain. The diffraction efficiency for a compensated 8 micron period grating was 84%, almost twice that of an uncompensated grating.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mats Ekberg, J. Michael Larsson, Fredrik K. Nikolajeff, Sverker Hard, "Proximity-compensated kinoforms directly written by e-beam lithography", Proc. SPIE 1718, Workshop on Digital Holography, (5 January 1993); doi: 10.1117/12.138556; https://doi.org/10.1117/12.138556

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