20 October 1992 Calibration of phase-shift interferometer
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Proceedings Volume 1720, Intl Symp on Optical Fabrication, Testing, and Surface Evaluation; (1992) https://doi.org/10.1117/12.132175
Event: International Symposium on Optical Fabrication, Testing, and Surface Evaluation, 1992, Tokyo, Japan
Abstract
For thin film technology, the thickness of a thin film can be controlled and measured very accurately, which supplies a standard for the calibration of a phase shift interferometer. We use a one-eight wave thin film to calibrate the 90 degree(s) phase shift for a phase shift interferometer. The interferometer is also used to measure the thickness of a thin film for checking its accuracy.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Der-Shen Wan, Wen-Shang Chiang, Ming-Wen Chang, "Calibration of phase-shift interferometer", Proc. SPIE 1720, Intl Symp on Optical Fabrication, Testing, and Surface Evaluation, (20 October 1992); doi: 10.1117/12.132175; https://doi.org/10.1117/12.132175
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