20 October 1992 Contour mapping of dynamic stress distributions by novel polarization interferometry
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Proceedings Volume 1720, Intl Symp on Optical Fabrication, Testing, and Surface Evaluation; (1992) https://doi.org/10.1117/12.132142
Event: International Symposium on Optical Fabrication, Testing, and Surface Evaluation, 1992, Tokyo, Japan
Abstract
A novel method for contour-mapping principal stress distributions is described. In the polarimeter developed, a reference beam of light consists of the two orthogonal linearly polarized components that interfere with their counterpart orthogonal components of an elliptically polarized signal beam of light. Two crossed interference patterns are formed over a MOS TV camera so that the significant parameters for determining a principal stress distribution can be recorded in a computer. The major advantage is that not only each of the two principal stresses but also the principal stress-difference can be independently determined, and no use of any optical component for polarization alignment makes it possible to follow a rapid change in stress distribution within the maximum frame rate 2066 s-1 of the MOS TV camera.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuhiko Oka, Yoshihiro Ohtsuka, "Contour mapping of dynamic stress distributions by novel polarization interferometry", Proc. SPIE 1720, Intl Symp on Optical Fabrication, Testing, and Surface Evaluation, (20 October 1992); doi: 10.1117/12.132142; https://doi.org/10.1117/12.132142
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