2 March 1993 Proximity-compensated kinoforms directly written by electron beam lithography
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Proceedings Volume 1732, Holographics International '92; (1993) https://doi.org/10.1117/12.140380
Event: Holographics International '92, 1992, London, United Kingdom
Abstract
We report on direct-writing EBL manufactured, proximity compensated blazed transmission gratings. The proximity compensation is made using a non-linear iterative process in the spatial domain. The diffraction efficiency for a compensated 8 micron period grating was 84%, almost twice that of an uncompensated grating.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mats Ekberg, J. Michael Larsson, Fredrik K. Nikolajeff, Sverker Hard, "Proximity-compensated kinoforms directly written by electron beam lithography", Proc. SPIE 1732, Holographics International '92, (2 March 1993); doi: 10.1117/12.140380; https://doi.org/10.1117/12.140380
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