Thermal stability of [Ni-Ti] multilayers

Malik Maaza; Claude Sella; Mustapha Kaabouchi; Jean Pierre Ambroise; Bruno Pardo; Francoise Bridou; Monique Miloche; Frantz Wehling; Michel Groos; Gloria Foulet; Hacene Lasri; Ramanthan Krishnan

doi:10.1117/12.130618

23 November 1992 Thermal stability of [Ni-Ti] multilayers

Malik Maaza, Claude Sella, Mustapha Kaabouchi, Jean Pierre Ambroise, Bruno Pardo, Francoise Bridou, Monique Miloche, Frantz Wehling, Michel Groos, Gloria Foulet, Hacene Lasri, Ramanthan Krishnan

Author Affiliations +

Proceedings Volume 1738, Neutron Optical Devices and Applications; (1992) https://doi.org/10.1117/12.130618
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Diffusion in Ni-Ti multilayers with a period of 120 angstroms is studied in the temperature range of 293 - 743 K by using the grazing angle unpolarized neutron reflectometry. It was shown that Ni diffuses into Ti in this temperature range. The effective diffusion coefficient Deff of Ni into Ti and its corresponding activation energy Qa are determined by measuring the decay of the reflectivity of first Bragg peak arising from the nuclear scattering length density modulation, as a function of annealing temperature at constant time. Two diffusion regimes separated by a pseudo-transition temperature Tc approximately equals 543 K are observed in this Ni-Ti multilayer. The corresponding activation energy values are 0.21 eV and 0.43 eV respectively. The unpolarized neutron reflectivity measurements are completed by crystalline structure, chemical profiling, and magnetic studies.

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Malik Maaza, Claude Sella, Mustapha Kaabouchi, Jean Pierre Ambroise, Bruno Pardo, Francoise Bridou, Monique Miloche, Frantz Wehling, Michel Groos, Gloria Foulet, Hacene Lasri, and Ramanthan Krishnan "Thermal stability of [Ni-Ti] multilayers", Proc. SPIE 1738, Neutron Optical Devices and Applications, (23 November 1992); https://doi.org/10.1117/12.130618

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