23 November 1992 Thin films for neutron optics
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Proceedings Volume 1738, Neutron Optical Devices and Applications; (1992); doi: 10.1117/12.130624
Event: San Diego '92, 1992, San Diego, CA, United States
Abstract
Thin film multilayers play a crucial role in the efficient transport of neutrons from the source to the experiments at the Swiss Neutron Spallation source SINQ. In order to develop and optimize the neutron optical components, a magnetron sputtering facility has been installed at PSI aimed at the deposition of thin films covering large substrate area. Initial uniformity tests are very encouraging showing thickness variation of only 1% for 5 nm layers over an area of 500 X 400 mm2. A detailed study of the structure and stability of Ni/Ti multilayers in relation to the deposition conditions is underway and results from analysis using TEM, neutron and x-ray diffraction and reflection are presented. The results point toward the use of alloyed materials and reactive sputtering to sharpen and stabilize the interface between Ni and Ti.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
O. Elsenhans, Peter Boeni, H. P. Friedli, Hans Grimmer, Philippe A. Buffat, K. Leifer, Ian S. Anderson, "Thin films for neutron optics", Proc. SPIE 1738, Neutron Optical Devices and Applications, (23 November 1992); doi: 10.1117/12.130624; https://doi.org/10.1117/12.130624
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KEYWORDS
Nickel

Multilayers

Sputter deposition

Optical components

Crystals

Scattering

Diffraction

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