Multilayer diffraction at 104-keV

Allen S. Krieger; Richard L. Blake; D. Peter Siddons

doi:10.1117/12.140567

21 January 1993 Multilayer diffraction at 104-keV

Allen S. Krieger, Richard L. Blake, D. Peter Siddons

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140567
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

We have measured the diffraction peak of a W:Si synthetic multilayer reflector at 104 keV using the High Energy Bonse-Hart Camera at the X-17B hard X-ray wiggler beam line of the National Synchrotron Light Source at Brookhaven National Laboratory. The characteristics of the diffraction peak are described and compared to theory.

Citation Download Citation

Allen S. Krieger, Richard L. Blake, and D. Peter Siddons "Multilayer diffraction at 104-keV", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140567

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