Multilayer thin-film design as far-ultraviolet polarizers

Jongmin Kim; Muamer Zukic; Douglas G. Torr

doi:10.1117/12.140575

21 January 1993 Multilayer thin-film design as far-ultraviolet polarizers

Jongmin Kim, Muamer Zukic, Douglas G. Torr

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140575
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

We use a concept of induced transmission and absorption to design multilayer thin film reflection polarizers in the FUV region. We achieve high s-polarization reflectance and a high degree of polarization by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of aluminum as the substrate. For convenience they are designed at a 45 deg angle of incidence. For example, our polarizer designed for the Lyman-alpha line (121.6 nm) has 88.67 percent reflectance for the s-polarization case, and 1.21 percent for the p-polarization case, with a degree of polarization of 97.31 percent. If we make a double surface polarizer with this design, it will have a degree of polarization of 99.96 percent and s-polarization throughput of 78.62 percent.

Citation Download Citation

Jongmin Kim, Muamer Zukic, and Douglas G. Torr "Multilayer thin-film design as far-ultraviolet polarizers", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140575

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