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21 January 1993 New method for achieving accurate thickness control for uniform and graded multilayer coatings on large flat substrates
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Abstract
High performance in normal incidence soft X-ray optical systems requires accurate control of the d-spacing across the surface of each mirror in the system. As a first step towards being able to fabricate any desired d-spacing variation, we demonstrate the ability to produce large (25 x 150 mm) flat Mo/Si multilayer coated mirrors with a d-spacing uniformity of +/- 0.4 percent. Instead of applying the approach most often taken to minimize the d-spacing variation physical shielding of the deposition source, we use a mask with a corrected profile positioned just in front of the rotating substrate to compensate for the nonuniform deposition flux. Results obtained from hard (lambda = 0.154 nm) and soft (wavelength of interest) X-ray mapping of the surface are presented along with a discussion of the technique used to control the d-spacing distribution.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
George Gutman, John E. Keem, Kevin Parker, James L. Wood, Richard N. Watts, and Charles Tarrio "New method for achieving accurate thickness control for uniform and graded multilayer coatings on large flat substrates", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140602
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