Nonspecular x-ray scattering from Si/Mo multilayers

Jon M. Slaughter; Charles M. Falco

doi:10.1117/12.140601

21 January 1993 Nonspecular x-ray scattering from Si/Mo multilayers

Jon M. Slaughter; Charles M. Falco

Author Affiliations +

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140601
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

A variety of low-angle X-ray diffraction (LAXRD) techniques are applied to the characterization of Si/Mo multilayers with the aim of developing nonspecular X-ray scattering as a characterization tool. Multilayers were sputter-deposited at different pressures in order to produce a wide variation in the intrinsic interface roughness. For each sample, four types of LAXRD measurements were performed: 0-20 (specular), offset 0-20, rocking curves (RCs), and scatter curves (SCs). In an offset 0-20 scan, the sample is misaligned just off the specular peak in order to measure the diffuse component of the 0-20 spectrum. These scans show that the diffuse scattering is modulated in a way similar to the specular. RCs taken on low-angle Bragg peak positions are characterized by a sharp specular spike on top of a broad diffuse hump. For an SC, the incident angle is held fixed and the detector swept. Structural parameters, such as spatial frequencies of the correlated roughness and a coherence length for the correlations, are determined.

Citation Download Citation

Jon M. Slaughter, Jon M. Slaughter, Charles M. Falco, Charles M. Falco, } "Nonspecular x-ray scattering from Si/Mo multilayers", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); doi: 10.1117/12.140601; https://doi.org/10.1117/12.140601

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