Present and future requirements of soft x-ray projection lithography

Hiroo Kinoshita

doi:10.1117/12.140589

21 January 1993 Present and future requirements of soft x-ray projection lithography

Hiroo Kinoshita

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140589
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

A soft-X-ray projection lithography system using multilayer mirrors has been developed. To determine the feasibility of a high throughput and a large exposure area, a reduction system consisting of two-mirror optics and a reflection mask were designed, fabricated, and assembled; and some trial replications of fine patterns were carried out. A full 4-inch wafer reflection mask was fabricated using a new process, and a high contrast and uniform quality throughout was obtained. Using the reflection mask, fine patterns of less than 0.25 micrometers and covering an area of 2 mm X 0.6 mm were faithfully replicated at a demagnification of 1/5.

Citation Download Citation

Hiroo Kinoshita "Present and future requirements of soft x-ray projection lithography", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140589

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