21 January 1993 Present and future requirements of soft x-ray projection lithography
Author Affiliations +
A soft-X-ray projection lithography system using multilayer mirrors has been developed. To determine the feasibility of a high throughput and a large exposure area, a reduction system consisting of two-mirror optics and a reflection mask were designed, fabricated, and assembled; and some trial replications of fine patterns were carried out. A full 4-inch wafer reflection mask was fabricated using a new process, and a high contrast and uniform quality throughout was obtained. Using the reflection mask, fine patterns of less than 0.25 micrometers and covering an area of 2 mm X 0.6 mm were faithfully replicated at a demagnification of 1/5.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroo Kinoshita, Hiroo Kinoshita, "Present and future requirements of soft x-ray projection lithography", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); doi: 10.1117/12.140589; https://doi.org/10.1117/12.140589


Advanced X-Ray Alignment System
Proceedings of SPIE (June 29 1986)
ACLV control in x-ray lithography
Proceedings of SPIE (June 04 1998)
XUV free-electron laser-based projection lithography systems
Proceedings of SPIE (January 31 1991)
Sophisticated masks
Proceedings of SPIE (February 28 1991)

Back to Top