Paper
11 December 1992 High-speed ellipsometry for the production of thin metal layers
Horst Schwiecker, Bui Dang Doi, Pham Thi Thanh Ha, J. Zilian, Ulrich Schneider, Joerg Heland
Author Affiliations +
Abstract
A new ellipsometer concept is presented for which no polarizing optical components in the conventional sense and no moveable elements are necessary. With four beam splitters and four detectors, four intensities are measured. These data are needed to obtain all four Stokes parameters S0, S1, 2, S3 of the Stokes vector and so the general state of polarization of the radiation. It is shown that it is possible to determine the `optical instrument matrix' A and the `general instrument matrix' B, characterizing the whole measuring system theoretically and experimentally. The results of ex- and in-situ measurements verify the accuracy of this measuring principle. Applying suitable electronics the ellipsometer can be used as a high speed measuring device for (Psi) and (Delta) . Therefore, it is especially useful for real-time ellipsometry to analyze dynamic processes at surfaces and thin films.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Horst Schwiecker, Bui Dang Doi, Pham Thi Thanh Ha, J. Zilian, Ulrich Schneider, and Joerg Heland "High-speed ellipsometry for the production of thin metal layers", Proc. SPIE 1746, Polarization Analysis and Measurement, (11 December 1992); https://doi.org/10.1117/12.138792
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications and 1 patent.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Beam splitters

Sensors

Calibration

Optical components

Ellipsometry

Polarization analysis

Silicon

Back to Top