13 January 1993 Artificial index surface relief diffraction optical elements
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Abstract
Using technologies originally developed for the electronics industry, like photolithography, e- beam writing, and dry etching, good quality diffractive elements with useful physical properties can be produced directly upon a given surface. Particularly interesting are grating structures in which the macroscopic properties differ from the microscopic properties. An example of this is when the dimensions of the micro-structure of the grating are much less than the incident wavelength. In this case the properties of the material in the microstructure are `averaged over,' in effect producing a new artificial or distributed index material. In this paper we discuss our preliminary results modelling, making, and measuring several such diffractive artificial index elements for use in the far IR.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sergey V. Babin, Helmut Haidner, Peter Kipfer, Adolf Lang, John T. Sheridan, Wilhelm Stork, and Norbert Streibl "Artificial index surface relief diffraction optical elements", Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); doi: 10.1117/12.138882; https://doi.org/10.1117/12.138882
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