Paper
13 January 1993 Fabrication and measurement of fused silica microlens arrays
Keith O. Mersereau, Casimir R. Nijander, Avi Y. Feldblum, Wesley P. Townsend
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Abstract
We report fabrication of refractive microlens arrays in fused silica (SiO2) with a variety of pitches, diameters, and focal lengths. Typical f-numbers range from f/1.5 to f/5. Melted photoresist lenses are made on a fused silica substrate, and etched into the SiO2 using reactive ion etching (RIE) by carefully controlling the etch ratio. Techniques for microlens testing and measurement are discussed.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keith O. Mersereau, Casimir R. Nijander, Avi Y. Feldblum, and Wesley P. Townsend "Fabrication and measurement of fused silica microlens arrays", Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); https://doi.org/10.1117/12.138900
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CITATIONS
Cited by 10 scholarly publications and 1 patent.
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KEYWORDS
Photoresist materials

Reactive ion etching

Etching

Silica

Lenses

Microlens

Microlens array

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