High-resolution optical lithography with a near-field scanning subwavelength aperture

Fred Franklin Froehlich; Tomas D. Milster; R. Uber

doi:10.1117/12.138895

Translator Disclaimer

13 January 1993 High-resolution optical lithography with a near-field scanning subwavelength aperture

Fred Franklin Froehlich, Tomas D. Milster, R. Uber

Author Affiliations +

Proceedings Volume 1751, Miniature and Micro-Optics: Fabrication and System Applications II; (1993) https://doi.org/10.1117/12.138895
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

We report on a novel method for generating sub-micron lithographic patterns in photoresist through the use of a scanned sub-wavelength optical aperture. The aperture consists of the tip of a single-mode optical fiber that is drawn down to a diameter of 80 nm and coated with aluminum. The fiber tip is manipulated with a modified scanning tunneling microscope (STM) that brings the tip into proximity of a photoresist-coated substrate. The resolution is primarily a function of the aperture diameter and tip-to-sample separation. A linewidth of 200 nm has been achieved in preliminary experiments.

Citation Download Citation

Fred Franklin Froehlich, Tomas D. Milster, and R. Uber "High-resolution optical lithography with a near-field scanning subwavelength aperture", Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); https://doi.org/10.1117/12.138895

ACCESS THE FULL ARTICLE