Translator Disclaimer
Paper
13 January 1993 High-resolution optical lithography with a near-field scanning subwavelength aperture
Author Affiliations +
Abstract
We report on a novel method for generating sub-micron lithographic patterns in photoresist through the use of a scanned sub-wavelength optical aperture. The aperture consists of the tip of a single-mode optical fiber that is drawn down to a diameter of 80 nm and coated with aluminum. The fiber tip is manipulated with a modified scanning tunneling microscope (STM) that brings the tip into proximity of a photoresist-coated substrate. The resolution is primarily a function of the aperture diameter and tip-to-sample separation. A linewidth of 200 nm has been achieved in preliminary experiments.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fred Franklin Froehlich, Tomas D. Milster, and R. Uber "High-resolution optical lithography with a near-field scanning subwavelength aperture", Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); https://doi.org/10.1117/12.138895
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
Back to Top