13 January 1993 Reflective 16-phase-level kinoform for beam array generator
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Proceedings Volume 1751, Miniature and Micro-Optics: Fabrication and System Applications II; (1993); doi: 10.1117/12.138878
Event: San Diego '92, 1992, San Diego, CA, United States
Abstract
This paper reports design and fabrication of reflective phase relief kinoform with 16 phase levels. This kinoform converts a single beam to a 5 X 5 beam array. The measured diffraction efficiency is 76.16%, near the designed one of 79.68%. The aperture of the kinoform is 10 mm X 10 mm.
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Pin Long, Dahsiung Hsu, Minxian Wu, Kuofan Chin, Shiping Gao, "Reflective 16-phase-level kinoform for beam array generator", Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); doi: 10.1117/12.138878; https://doi.org/10.1117/12.138878
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KEYWORDS
Computer generated holography

Diffraction

Etching

Reflectivity

Reactive ion etching

Binary data

Diffraction gratings

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