12 February 1993 Critical parameters for the preparation of low scatter electroless nickel coatings
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Abstract
Scattering sites in diamond-turned electroless nickel (EN) coatings are typically the result of surface defects originating from the plating process. This paper presents a description of these defects, their origin, and how they can be minimized.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Douglas L. Hibbard, "Critical parameters for the preparation of low scatter electroless nickel coatings", Proc. SPIE 1753, Stray Radiation in Optical Systems II, (12 February 1993); doi: 10.1117/12.140699; https://doi.org/10.1117/12.140699
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