Evaluation of the ultraviolet/ozone technique for on-orbit removal of photolyzed molecular contamination from optical surfaces

Mark E. Frink; Mark A. Folkman; Lane A. Darnton

doi:10.1117/12.140739

18 December 1992 Evaluation of the ultraviolet/ozone technique for on-orbit removal of photolyzed molecular contamination from optical surfaces

Mark E. Frink, Mark A. Folkman, Lane A. Darnton

Author Affiliations +

Proceedings Volume 1754, Optical System Contamination: Effects, Measurement, Control III; (1992) https://doi.org/10.1117/12.140739
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Molecular species outgassed from spacecraft materials adhere tenaciously to and darken spacecraft surfaces when exposed to solar ultraviolet (UV) radiation. Such deposits severely degrade the performance of optical systems operating at UV and visible wavelengths. Data is presented which demonstrates the feasibility of a UV/Ozone cleaning technique in removing such deposits in a space-compatible configuration without damage to the optical surface. The technique involves the UV irradiation of the optical surface in the presence of low pressure molecular oxygen, resulting in the photolytic formation of ozone (O₃) and subsequent photochemical removal of the contamination.

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Mark E. Frink, Mark A. Folkman, and Lane A. Darnton "Evaluation of the ultraviolet/ozone technique for on-orbit removal of photolyzed molecular contamination from optical surfaces", Proc. SPIE 1754, Optical System Contamination: Effects, Measurement, Control III, (18 December 1992); doi: 10.1117/12.140739; https://doi.org/10.1117/12.140739

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