Paper
20 November 1992 Diamond CVD growth chemistry
Wayne A. Weimer, Curtis E. Johnson
Author Affiliations +
Abstract
Results accumulated in our laboratory and elsewhere suggest that a common reaction mechanism is operative in all of the diamond CVD techniques using a hydrocarbon diluted in hydrogen as the reactor gas feed composition. Detailed investigations into the chemistry involved in diamond CVD have been conducted using microwave plasma assisted CVD and DC arc jet plasma CVD reactors. Results from optical spectroscopic, mass spectrometric, electrostatic probe and kinetic model calculations support a applicability of a mechanism originally developed to describe the oxidation of methane in flames to diamond CVD. The evidence supporting this applicability along with relevant implications for future directions in diamond research will be discussed.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wayne A. Weimer and Curtis E. Johnson "Diamond CVD growth chemistry", Proc. SPIE 1759, Diamond Optics V, (20 November 1992); https://doi.org/10.1117/12.130776
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Cited by 1 scholarly publication.
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KEYWORDS
Diamond

Plasma

Chemical vapor deposition

Microwave radiation

Chemistry

Carbon

Carbon monoxide

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