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20 November 1992 Polishing of CVD diamond films with abrasive liquidjets: an exploratoryinvestigation
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Abstract
An exploratory study was conducted to determine the feasibility of polishing CVD diamond films with abrasive-liquidjets. A nozzle system that produces a high-velocity radial flow (between nozzle and workpiece) with zero or near-zero impact angles was used for polishing tests. The abrasive particles are acted upon by hydrodynamic forces to effect polishing. The relatively high particle flow rates (10 g/s) and velocities (over 150 m/s) result in relatively high polishing rates. The inertial effect of the abrasive particles appears to contribute significantly to the material removal. A diamond film was polished from 3 to 1.3 microns at a rate of 2.7 micron/s/mm2 using 600-mesh SiC abrasives.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mohamed Hashish and David Bothell "Polishing of CVD diamond films with abrasive liquidjets: an exploratoryinvestigation", Proc. SPIE 1759, Diamond Optics V, (20 November 1992); https://doi.org/10.1117/12.130780
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