4 March 1993 Ellipsometric analysis of quadrilayer magneto-optic recording media
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Abstract
Recently, a lot of magneto-optical (MO) thin film media composed from an active MO film and some other dielectric and metallic films, used for optimization of MO response, were suggested. Practical realization of such complicated systems also requires the possibility of ex- post characterization of the prepared sample in the sense of determination of exact film thicknesses and/or optical constants. In this paper we discuss ellipsometric data obtained on a sputter deposited system ZnS/TbFeCo/ZnS/Al/glass in a spectral region 350 - 800 nm and angle of incidence 50 - 85 deg (step 2.5 deg). We used null ellipsometer Rudolph 436 equipped by a set of interference filters and computer software enabling simultaneous calculation of sample characteristics from angle of incidence and spectral dependent measurement. Using other pieces of information -- in our case normal reflectivity and RBS measurement -- proved to be very fruitful. Complexity of the system under discussion (at least three, more or less absorbing, films on an absorbing substrate) is further enlarged by chemical properties of individual films -- high reactivity of Al and TbFeCo and complicated deposition of stoichiometric ZnS can be noted as examples.
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Petr Siroky, Jiri Hrdina, Ron Atkinson, Lubomir Jastrabik, Vratislav Perina, "Ellipsometric analysis of quadrilayer magneto-optic recording media", Proc. SPIE 1782, Thin Films for Optical Systems, (4 March 1993); doi: 10.1117/12.141026; https://doi.org/10.1117/12.141026
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