4 March 1993 Preparation and properities of high-index oxide films for application to laser optics
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Abstract
HfO2, Y203, and Sc2O3 thin films and multilayer systems in combination with SiO2 as a low index component were deposited by laser beam evaporation. Absorption was measured by photothermal displacement spectroscopy at the wavelength of 1060 nm, whereas laser damage thresholds were determined at 248 and 1060 nm. Relations between laser damage, absorption, and thin film preparation are investigated.
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Dieter Schaefer, V. Guepner, Reinhard Wolf, Bernhard Steiger, G. Pfeifer, and J. Franke "Preparation and properities of high-index oxide films for application to laser optics", Proc. SPIE 1782, Thin Films for Optical Systems, (4 March 1993); doi: 10.1117/12.141046; https://doi.org/10.1117/12.141046
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