4 March 1993 Stable starting materials of tantalum pentaoxide and titanium dioxide
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Proceedings Volume 1782, Thin Films for Optical Systems; (1993); doi: 10.1117/12.141016
Event: Optical Systems Design '92, 1992, Berlin, Germany
Abstract
For obtaining thermally resistive and stable high-index materials, Ta2O5 films from a noble starting material of Ta2O5 + Ta (7 wt% added) have been developed, considering the analogy established in the case of TiO2 films. The related optical (refractive index and absorption) and stress properties both of Ta2O5 and TiO2 films are reported.
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Shigetaro Ogura, Tomonori Aoki, "Stable starting materials of tantalum pentaoxide and titanium dioxide", Proc. SPIE 1782, Thin Films for Optical Systems, (4 March 1993); doi: 10.1117/12.141016; https://doi.org/10.1117/12.141016
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KEYWORDS
Tantalum

Absorption

Electron beams

Titanium dioxide

Metals

Oxygen

Thin films

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