Influence of implanted ion charge on electrophysical parameters of formed structures

Yakh'ya V. Fattakhov; Evelina Yu. Karas; Il'dus B. Khaibullin; Nadegda V. Kurbatova; Evgeny I. Shtyrkov

doi:10.1117/12.131053

1 August 1992 Influence of implanted ion charge on electrophysical parameters of formed structures

Yakh'ya V. Fattakhov, Evelina Yu. Karas, Il'dus B. Khaibullin, Nadegda V. Kurbatova, Evgeny I. Shtyrkov

Proceedings Volume 1783, International Conference of Microelectronics: Microelectronics '92; (1992) https://doi.org/10.1117/12.131053
Event: International Conference on Microelectronics, 1992, Warsaw, Poland

Abstract

It has been shown that during the implantation of some ions with the same energy but different charges, amorphous layers of different thickness are observed. To elucidate the reasons of the effect observed, new experiments using ellipsometric and electrophysical measurements have been carried out.

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Yakh'ya V. Fattakhov, Evelina Yu. Karas, Il'dus B. Khaibullin, Nadegda V. Kurbatova, and Evgeny I. Shtyrkov "Influence of implanted ion charge on electrophysical parameters of formed structures", Proc. SPIE 1783, International Conference of Microelectronics: Microelectronics '92, (1 August 1992); https://doi.org/10.1117/12.131053

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