16 March 1993 Contribution to optimal lamp design in rapid thermal processing
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Proceedings Volume 1804, Rapid Thermal and Laser Processing; (1993) https://doi.org/10.1117/12.142091
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States
Recent studies of wafer temperature control in rapid thermal processing systems have indicated that a multi-ring circularly symmetric lamp configuration with independent (multivariable) control of the power applied to each ring is likely to be more successful than the earlier lamp design approaches. An important issue in such multi-ring lamp systems is the optimal shaping of the output heat flux profile (HFP) of each ring, as measured at the wafer surface with a reference value of input power, to provide good controllability of the wafer temperature. In this paper we seek to optimize the ring HFPs via the lamp design parameters: ring positions and widths. We start by determining the heat loss profiles over the wafer surface for a variety of temperature setpoints and processing conditions. In order to maintain temperature uniformity across the wafer at a given setpoint, the lamp system should provide a compensating HFP. The total lamp HFP is the sum of the individual ring HFPs weighted by their respective applied powers. The HFPs are, in turn, functionally dependent on the lamp design parameters and this dependence can be measured through a calibration process. Therefore, the resulting optimization problem reduces to determining the lamp design parameters that result in a total lamp HFP which best approximates the collection of the wafer heat loss profiles. Our method provides a practical technique for determining the optimal lamp design parameters.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Young Man Cho, Young Man Cho, Arogyaswami Paulraj, Arogyaswami Paulraj, Stephen A. Norman, Stephen A. Norman, Guanghan Xu, Guanghan Xu, Thomas Kailath, Thomas Kailath, } "Contribution to optimal lamp design in rapid thermal processing", Proc. SPIE 1804, Rapid Thermal and Laser Processing, (16 March 1993); doi: 10.1117/12.142091; https://doi.org/10.1117/12.142091

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