26 March 1993 Application of laser scatterometry to characterize phase-shifting masks
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Abstract
Laser scatterometry is a noncontact, rapid method of collecting and analyzing light scattered from a structure. We have applied optical scatter techniques to measure the surface roughness as well as the etch depth of phase shifting masks (PSMs). Experimental results and theoretical modeling are discussed.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Susan M. Wilson, Susan M. Wilson, Gary A. Peterson, Gary A. Peterson, S. Sohail H. Naqvi, S. Sohail H. Naqvi, John Robert McNeil, John Robert McNeil, } "Application of laser scatterometry to characterize phase-shifting masks", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); doi: 10.1117/12.142147; https://doi.org/10.1117/12.142147
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