New role of high-sensitivity database inspection

Rosanne LaVoy

doi:10.1117/12.142139

26 March 1993 New role of high-sensitivity database inspection

Rosanne LaVoy

Proceedings Volume 1809, 12th Annual BACUS Symposium on Photomask Technology and Management; (1993) https://doi.org/10.1117/12.142139
Event: Photomask Technology, 1992, Sunnyville, CA, United States

Abstract

In the past, database inspection of photo masks has been used primarily as design verification; defect inspection was done only as a last resort. The increase of single die reticles has forced increasing use of database for defect inspection, but at the cost of sensitivity and through put time (TPT). With the advent of fast throughput and high sensitivity database systems, the use of database for inspection of photo masks is taking on a new role. The comparison of chrome on glass photo masks to the ideal database can now be used to quantify mask parameters such as process bias uniformity, edge roughness, and transmission uniformity in addition to defects. Database inspection will move from the realm of a last resort option to a preferred option. The user must now be prepared to understand and use the valuable data now available to them to quantify the quality of their mask, and improve their process. Intel designed artifact masks were created to quantify process bias uniformity in addition to other defects. Using mask to database inspection, critical dimension (CD) process uniformity, and edge roughness in addition to both traditional and thoroughness defects, were quantified throughout the active area. Results presented demonstrate the additional information now available to the mask engineer to evaluate mask quality, and implement process changes.

Citation Download Citation

Rosanne LaVoy "New role of high-sensitivity database inspection", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142139

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available